Graftek Imaging

Graftek Imaging

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  • Bottle Inspection System

    • New software with more intuitive user interface
    • Multiple (200) measurements around the bottle
    • Wide range of bottle sizes and neck supported
    • New measurement- lug diameter for trigger bottles
    • Simple software that minimizes training
    • Minimal maintenance for operation
    • Simple software user interface for operators
  • Color Recognition Imaging System

    • No operator training
    • Check colors anywhere
    • Get same measurements with multiple systems
    • Color classification at pixel level
    • Customized measurements based on color classification
    • Samples up to 200 mm x 200mm
    • Integrated touchscreen
    • Historical record keeping
  • Display Inspection Vision System

    • Suitable for displays between 10.1″ and 22″
    • Provides high-quality illumination
    • Cleans UUT for accurate inspection
    • Identifies defects based on criteria
    • Easy to operate
    • Generates comprehensive reports
    • Ensures reliable results
    • Provides guidelines for upkeep
    • Compatible with other quality control systems
    • Can be tailored to specific needs
  • FCA-02

    • Adapter for F-Mount Lens To C-Mount Camera
    $100.00
  • Graftek Imaging GTK-KIT-VS-14ST, Machine Vision Training Kit

    GTK-KIT-VS-14ST

    • Machine Vision Training Kit, includes
      • Lighting
      • Optics
      • Camera
      • Mounting Hardware and Accessories
    • for use with NI 910543-XX
    $3328.00
  • Monolith Open Area Testing System

    • Designed for Monolith Inspection
    • 8.3 µm/px resolution
    • 12″ x 10.5″ Inspection area
    • 1.5 – 6 min Inspection time
    • High-resolution imaging in a single pass
    • No manual repositioning of monoliths required
    • < 2 seconds image processing time per monolith
    • Intuitive, Touchscreen User Interface
    • Seamless Data Logging and Historical Review
    • Tested and validated for coated and uncoated monoliths
    • Fully customizable to meet specific inspection requirements

     

  • Residue Detection System

    • Covered under our Patent US20140263981A1, whose advanced lighting technology improves contrast for detecting metal particles on patterned surfaces
    • 200mm Wafer Inspection
    • ≥ 5 mm Defect Detection
    • Up to 300 Wafers inspected per hour
    • 99.9% inspection in one shot
    • No movement of the wafer required
    • <1 second processing time
    • User-Friendly Interface
    • Seamless Integration with QC Systems
    • Tested and validated for Copper and Tungsten
    • Customizable Configuration

     

  • System Design Review

    System Design Review

    • Have you made the right decisions?
    • Request a vision system design review.
    $250.00
  • System Design Service

    • Creating Your Vision Together!
    • Get Expert Assistance With
      • Lighting
      • Lens Filters
      • Optics
      • Cameras
      • Software
      • Mounting Hardware and Accessories
    $250.00