Graftek Turnkey Systems
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Residue Detection System
- Covered under our Patent US20140263981A1, whose advanced lighting technology improves contrast for detecting metal particles on patterned surfaces
- 200mm Wafer Inspection
- ≥ 5 mm Defect Detection
- Up to 300 Wafers inspected per hour
- 99.9% inspection in one shot
- No movement of the wafer required
- <1 second processing time
- User-Friendly Interface
- Seamless Integration with QC Systems
- Tested and validated for Copper and Tungsten
- Customizable Configuration
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Display Inspection Vision System
- Suitable for displays between 10.1″ and 22″
- Provides high-quality illumination
- Cleans UUT for accurate inspection
- Identifies defects based on criteria
- Easy to operate
- Generates comprehensive reports
- Ensures reliable results
- Provides guidelines for upkeep
- Compatible with other quality control systems
- Can be tailored to specific needs
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CRIS-12
- No operator training
- Check colors anywhere
- Get same measurements with multiple systems
- Color classification at pixel level
- Customized measurements based on color classification
- Samples up to 200 mm x 200mm
- Integrated touchscreen
- Historical record keeping
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Bottle Inspection System
- New software with more intuitive user interface
- Multiple (200) measurements around the bottle
- Wide range of bottle sizes and neck supported
- New measurement- lug diameter for trigger bottles
- Simple software that minimizes training
- Minimal maintenance for operation
- Simple software user interface for operators