Graftek Turnkey Systems

  • Residue Detection System

    • Covered under our Patent US20140263981A1, whose advanced lighting technology improves contrast for detecting metal particles on patterned surfaces
    • 200mm Wafer Inspection
    • ≥ 5 mm Defect Detection
    • Up to 300 Wafers inspected per hour
    • 99.9% inspection in one shot
    • No movement of the wafer required
    • <1 second processing time
    • User-Friendly Interface
    • Seamless Integration with QC Systems
    • Tested and validated for Copper and Tungsten
    • Customizable Configuration

     

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  • Display Inspection Vision System

    • Suitable for displays between 10.1″ and 22″
    • Provides high-quality illumination
    • Cleans UUT for accurate inspection
    • Identifies defects based on criteria
    • Easy to operate
    • Generates comprehensive reports
    • Ensures reliable results
    • Provides guidelines for upkeep
    • Compatible with other quality control systems
    • Can be tailored to specific needs
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  • CRIS-12

    • No operator training
    • Check colors anywhere
    • Get same measurements with multiple systems
    • Color classification at pixel level
    • Customized measurements based on color classification
    • Samples up to 200 mm x 200mm
    • Integrated touchscreen
    • Historical record keeping
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  • Bottle Inspection System

    • New software with more intuitive user interface
    • Multiple (200) measurements around the bottle
    • Wide range of bottle sizes and neck supported
    • New measurement- lug diameter for trigger bottles
    • Simple software that minimizes training
    • Minimal maintenance for operation
    • Simple software user interface for operators
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